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[1] V. Stranak, A-P. Herrendorf, H. Wulff, S. Drache, M. Cada, Z. Hubicka, M. Tichy, R. Hippler, Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering, Surf. Coat. Technol. 222, (2013), 112-117.

[2] S. Drache, V. Stranak, A-P. Herrendorf, M. Cada, Z. Hubicka, M. Tichy, R. Hippler, Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges, Vacuum 90, 2013, 176-181.

[3] V. Stranak, Ann-Pierra Herrendorf, S. Drache, M. Cada, Z. Hubicka, R. Bogdanowicz, M. Tichy, R. Hippler, Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance, J. Appl. Phys. 112, (2012), 093305.

[4] V. Stranak, A.-P. Herrendorf, S. Drache, M. Cada, Z. Hubicka, M. Tichy, R. Hippler, Highly ionized physical vapor deposition plasma source working at very low pressure, Appl. Phys. Lett. 100/14, 2012, 141604.

[5] B. Finke, M. Polak, F. Hempel, H. Rebl, C Zietz, V. Stranak, G. Lukowski, R. Hippler, R. Bader, B. Nebe, K-D. Weltmann, K. Schröder, Antimicrobial Potential of Copper Containing Titanium Surfaces Generated by Ion Implantation and Dual High Power Impulse Magnetron Sputtering, Adv. Eng. Mat. 14/5, (2012), DOI: 10.1002/adem.201180054

[6] R. Bogdanowicz, M. Smietana, M. Gnyba, M. Ficek, V. Stranak, L. Golunski, M. Sobaszek, J. Ryl, Nucleation and growth of CVD diamond on fused silica optical fibres with titanium dioxide interlayer, Phys. Status Solidi A 1-7, (2013),  DOI 10.1002/pssa.201300096.

[7] N. Patenge, K. Arndt, T. Eggert, C. Zietz, B. Kreikemeyer, R. Bader, B. Nebe, V. Stranak, R. Hippler, A. Podbielski, Evaluation of antimicrobial effects of novel implant materials by testing the prevention of biofilm formation using a simple small scale medium-throughput growth inhibition assay, Biofouling 28, Issue 3, (2012), 267-277, DOI:10.1080/08927014.2012.671305.

[8] C. Zietz, A. Fritsche, B. Finke, V. Stranak, M. Haenle, R. Hippler, W. Mittelmeier, R. Bader, Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry, Bioinorgan. Chem. Appl. 2012, (2012), 850390, doi:10.1155/2012/8503905

[9] A. Hoene, M. Patrzyk, U. Walschus, V. Stranak, R. Hippler, H. Testrich, J. Meichsner, Juergen, B. Finke, H. Rebl, B. Nebe, C. Zietz, R. Bader, Rainer, A. Podbielski, M. Schlosser, In vivo examination of the local inflammatory response after implantation of Ti6Al4V samples with a combined low-temperature plasma treatment using pulsed magnetron sputtering of copper and plasma-polymerized ethylenediamine, Journal of Material Science - Materials in Medicine 24, (2013), pp 761-771.

[10] V. Stranak, S. Drache, R. Bogdanowicz, H. Wulff, A-P. Herrendorf, Z. Hubicka, M. Cada, M. Tichy, R. Hippler, Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering, Surf. Coat. Technol 206, (2012), 2801-2809.

[11]  V. Stranak, S. Drache, R. Bogdanowicz, H. Wulff, A-P. Herrendorf, Z. Hubicka, M. Cada, M. Tichy, R. Hippler, Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering. Surf. Coat. Technol.  accepted, in print, available on-line.

[12]  V. Stranak, H. Wulff, R. Bogdanowicz, S. Drache, Z. Hubicka, M. Cada, M. Tichy, R. Hippler, Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges. Eur. Phys. J. D: Appl. Phys.  64, (2011) 427–435.

[13]  V.  Stranak, R. Bogdanowicz, S. Drache, M. Cada, Z. Hubicka, R. Hippler, Dynamic Study of Dual High-Power Impulse Magnetron Sputtering Discharge by Optical Emission Imaging. IEEE Trans. Plasma Sci. 39(11), (2011) 2454-2455.

[14]  V. Stranak, S. Drache, M. Cada, Z. Hubicka, M. Tichy, R. Hippler, Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 μs and 500 μs. Contrib. Plasma Phys. 51 (2-3), (2011), 237-245

[15]  V. Stranak, S. Block, S. Drache, Z. Hubicka, C.A. Helm, L. Jastrabik, M. Tichy, R. Hippler, Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system. Surf. Coat. Technol. 205, (2011), 2755-2762.

[16]  V. Stranak, H. Wulff, H. Rebl, C. Zietz, K. Arndt, R. Bogdanowicz, B. Nebe, R. Bader, A. Podbielski, Z. Hubicka, R. Hippler, Deposition of Thin Titanium-Copper Films with Antimicrobial Effect by Advanced Magnetron Sputtering Methods. Mat. Sci. Eng. C 31, (2011), 1512–1519.

[17]  V. Stranak, M. Cada, Z. Hubicka, M. Tichy, R. Hippler, Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films. J. Appl. Phys. 108, (2010), 043305.

[18]  V. Stranak, M. Quaas, R. Bogdanowicz, H. Steffen, H. Wulff, Z. Hubicka, M. Tichy, R. Hippler, Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering, J. Phys. D: Appl. Phys. 43, (2010), 28523.

[19] B. Sera, M. Sery, V. Stranak, P. Spatenka, M. Tichy, Does cold plasma affect breaking dormancy and seed germination? A study on Seeds of Lambs Quarters (Chenopodium album agg.). Plasma Sci. Technol. 11/6, (2009), 750-754.

[20] V. Stranak, M. Cada, M. Quaas, S. Block, R. Bogdanowicz, S. Kment, H. Wulff, Z. Hubicka, Ch. A. Helm, M. Tichy, R. Hippler, Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure. J. Phys. D: Appl. Phys. 42, (2009).

[21] S. Kment, P. Kluson, V. Stranak, P. Virostko, J. Krysa, M. Cada, J. Pracharova, M. Kohout, M. Morozova, P. Adamek, Z. Hubicka, Photo-induced electrochemical functionality of the TiO2 nanoscale films. Electrochimica Acta 54 (12), (2009), 3352-3359.

[22] V. Stranak, M. Quaas, H. Wulff, Z. Hubicka, S. Wrehde, M. Tichy, R. Hippler, Fromation of TiOx films produced by high-power pulsed magnetron sputtering. J. Phys. D: Appl. Phys. 41, (2008), 055202.

[23] V. Stranak, J. Blazek, S. Wrehde, P. Adamek, Z. Hubicka, M. Tichy, P. Spatenka, R. Hippler, Study of Electronegative Ar/O2 discharge by means of Langmuir probe. Contrib. Plasma Phys. 48 (5-7), (2008), 503-508.

[24] B. Sera, V. Stranak, M. Sery, M. Tichy, P. Spatenka, Germination of Chenopodium Album in Response to Microwave Plasma Treatment. Plasma Sci. Technol. 10 (4), (2008), 506-512.

[25] V. Stranak, M. Tichy, V. Kriha, V. Scholtz, B. Sera, P. Spatenka, Technological Applications of Surfatron Produced Discharge. J. Optoelectr. Adv. Mater. 9 (No. 4), (2007).

[26] V. Stranak, P. Adamek, J. Blazek, M. Tichy, P. Spatenka, Probe diagnostic of microwave plasma at frequency 2.45 GHz in cw and pulse regime. Contrib. Plasma Phys. 46, No. 5-6, (2006), 439-444.

[27] V. Stranak, Z. Hubicka, P. Adamek, J. Blazek, M. Tichy, P. Spatenka, R. Hippler, S. Wrehde, Investigation of the time evolution of plasma parameters in a pulsed magnetron discharge. Czech. J. Phys. 56, (2006), B1364-B1370.

[28] V. Stranak, V. Kriha, V. Scholtz, J. Koller, M. Tichy, P. Spatenka, Surfatron plasma-based sterilisation. Czech. J. Phys. 56, (2006), B843-B847.

[29] V. Stranak, Z. Hubicka, P. Adamek, J. Blazek, M. Tichy, P. Spatenka, R. Hippler, S. Wrehde, Time-resolved probe diagnostics of pulsed dc magnetron discharge during deposition of TiOx layers. Surf. Coat. Technol. 21, (2006), 2512-2519.

[30] J. Blazek, P. Kriz, V. Stranak, P. Spatenka, Diagnostics of low-temperature plasma by refractional methods. Czech. J. Phys. 56, (2006), B664-B650.

[31] R. Hippler, S. Wrehde, V. Stranak, O. Zhigalov, H. Steffen, M. Tichy, M. Quaas, H. Wulff, Characterisation of a magnetron plasma for deposition of titanium oxide and titanium nitride films. Contrib. Plasma Phys. 45, (2005), 348-357.

[32] V. Stranak, H. Steffen, S. Wrehde, R. Hippler, M. Tichy, Investigation of plasma parameters in the dc planar magnetron in balanced and unbalanced mode. Czech. J. Phys. 54, (2004), 826-827.

[33] V. Stranak, P. Slavicek, Z. Navratil, P. Adamek, M. Tichy, P. Spatenka, D. Trunec, Diagnostics of surfatron-generated plasma by probe measurements and emission spectroscopy. Czech. J. Phys. 54, (2004), 970-975.

[34] P. Kriz, V. Stranak, J. Blazek, Study of the parameters of barrier torch discharge. Czech. J. Phys. 52/D, (2002), 509-514.

 

Konferenční příspěvky - přednášky

 

[1] V. Stranak, S. Drache, A-P. Herrendorf, R. Bogdanowicz, H. Wulff, Z. Hubicka, M. Cada, R. Hippler, Complex diagnostics of hybrid dual-high power impulse magnetron sputtering system during deposition of functional thin films. In. Book of abstracts of Inovations in Thin Film Processing and Characterisation & Magnetron, Ion Processing and Arc Technologies European Conference ITFPC & MIATEC, Nancy, November 15-17, (2011), ISBN 978-2-918641-11-7.

[2] V. Stranak, H. Wulff, Z. Hubicka, R. Bogdanowicz, H. Rebl, C. Zietz, K. Arndt, B. Nebe, R. Bader, A. Podbielski, R. Hippler, Deposition of functional thin films for bio-medical applications by means of high power impulse magnetron sputtering. In. Book of abstracts of VI Symposium on Vacuum Based Science and Technology, Kolobrzeg, September 20-22, (2011), pp.23., ISBN 978-83-7365-265-1.

[3] V. Stranak, Z. Hubicka, S. Drache, M. Cada, R. Bogdanowicz, H. Wulff, R. Hippler,  Time-resolved investigation of hybrid dual-HiPIMS discharge during deposition of intermetallic Ti-Cu films. In: Book of abstracts of 2nd International Conference on Fundamentals and Application of HiPIMS 2011, Braunschweig, June 28-29 (2011), pp.32.

[4] V. Stranak, Z. Hubicka, H. Rebl. C. Zietz, K. Arndt, B. Nebe, R. Bader, A. Podbielski, R. Hipper. Multi-structural films with fast antimicrobial shock effect deposited by pulsed magnetron sputtering. In. Book of abstracts of 3rd International Conference on Plasma Medicine 2010, Greifswald, September 19-24, (2010), (eds. K.-D. Weltmann), 75.

[5] V. Stranak, Z. Hubicka, M. Cada, H. Wulff, R. Hippler, Time-resolved investigation of dual High Power Impulsed Magnetron Sputtering system with closed magnetic field during deposition of Ti-Cu thin films. In: Book of abstracts of 1st International conference on HIPIMS, Sheffield, July 6-7, (2010), p.31.

[6] V. Stranak, M. Quass, Z. Hubicka, L. Jastrabik, C.A. Helm, R. Hippler, Deposition of bio-compatible multistructural thin Ti-Cu films. In: Conference Proceedings of 3rd Workshop on Low Cost Plasma Technology Applications in Industry, Environment and Medicine, Cairo, November 7– 12, (2009).

[7] V. Stranak, S. Block, S. Drache, Z. Hubicka, L. Jastrabik, C.A. Helm, R. Hippler, Formation of Cu clusters by pulsed magnetron sputtering. In: Conference Proceedings of 2nd  International Conference on Advanced Plasma Technologis with 1st International Plasma Nanoscience Symposium 2009, Piran (Slovenia), September 29 – October 2, (2009), 77, (eds. U. Cvelbar, M. Mozetic), ISBN 978-961-90025-8-2.

[8] V. Stranak, J. Blazek, M. Tichy, Z. Hubicka, P. Spatenka, S. Wrehde, R. Hippler, Study of slightly electronegative Ar/O2 discharge by means of Langmuir probe. In: Book of abstracts of 7th International Workshop on Electrostatics Probe in Magnetized Plasma, Prague,          July 22-25, (2007), (eds. M. Tichy, P. Kudrna, V. Stranak), 10, ISBN 978-80-7378-010-4.

[9] V. Stranak, P. Slavicek, Z. Navratil, P. Adamek, M. Tichy, P. Spatenka, D. Trunec, Diagnostics of Surfatron-generated Plasma by Probe Measurements and Emission Spectroscopy. In: Book of abstracts of 21th Symposium on Plasma Physics and Technology, Prague, June 14-17, (2004) (eds. Koller, J., Pichal), ISBN 80-01-03015-6,

 

Konferenční příspěvky – posterová sdělení

 

[1] V. Stranak, H.T. Do, S. Drache, Z. Hubicka, M. Cada, M. Tichy, R. Hippler, Time-resolved diagnostics of magnetically confined pulsed magnetron plasma. In: Book of abstracts of International Conference on Research and Applications of Plasmas – Plasma 2011, Warsaw, September 12-16 (2011).

[2] V. Stranak, H. T. Do, S. Drache, Z. Hubicka, M. Cada, R. Hippler,  Time-resolved diagnostics of dual high power impulse magnetron sputtering during deposition of functional thin films, In: Book of abstracts of the IX. Workshop on Frontiers in Low Temperature Plasma Diagnostics, Zinnowitz, May 9-12, (2011), P10.

[3] S. Drache, V. Stranak, A.-P. Herrendorf, R. Bogdanowicz, H. Wulff, Z. Hubicka and R. Hippler, Time-resolved diagnostics of pulsed sputtering discharges, In: Book of abstracts of DPG Spring Meeting – Section of Plasma Physics, Kiel, March 28-31 (2011), pp. 35, ISSN 0420-0195.

[4] V. Stranak, M. Cada, Z. Hubicka, H. Wulff, K. Schroeder, R. Hippler, Time-resolved diagnostics of high power pulsed magnetron discharges during formation of antimicrobial Ti-Cu films. In: Book of abstracts of Physical Surface Engineering 2010 conference, Garmisch-Partenkirchen (Germany), September 13-17, (2010), (eds. board W. Moller, R. Tietema, Th. Czerwicec, U. Helmersson, G.J. van der Kolk, C. Oehr, A. Cavaleiro), 215.

[5] V. Stranak, H. Nowakowska, Z. Hubicka, M. Tichy, R. Hippler, Double surface wave discharge – a new kind of wave sustained discharges. In: Proceedings of the 20th ESCAMPIG 2010 conference, Novi Sad (Serbia), July 13-17, (2010), (eds. Z. Petrovic, G. Malovic, D. Maric), volume 43, ISBN 2-914771-63-0.

[6] Z. Hubicka, M. Cada, V. Stranak, S. Kment, L. Jastrabik, Investigation of HiPIMS sputtering systems used for deposition of TiO2 and TiO2:N thin films. In: Book of abstracts of 1st International conference on HIPIMS, Sheffield, July 6-7, (2010), p.41.

[7] V. Stranak, Z. Hubicka, M. Cada, R. Rebl, C. Zietz, K. Arndt, B. Nebe, R. Bader, A. Podbielski, R. Hippler, Deposition of Ti-Cu films with fast antimicrobial effect prepared by multicomponent High Power Impulsed Magnetron Sputtering. In: Book of abstracts of 24th Sypmosium on Plasma Physics and Technology (SPPT 2010), Prague, June 14-17, (2010), pp.115, ISBN 978-80-01-04548-0.

[8] V. Stranak, M. Quaas, M. Cada, Z. Hubicka, C. Zietz, K. Arndt, R. Bader, A. Podbielski, R. Hippler, Deposition of multi-structural biocompatible thin films with an antimicrobial effect by pulsed magnetron sputtering, In: Book of abstracts of DPG Spring Meeting – Section of Condensed Matter, Regensburg, March 21-26, (2010), pp. 222 (DS 9.38), ISSN 0420-0195.

[9] V. Stranak, M. Quaas, R. Bogdanowicz, Z. Hubicka, H. Steffen, K. Schroeder, K.D. Weltmann, R. Hippler, Effect of nitrogen doping on properties of TiOxNy thin films prepared by High Power Impulsed Magnetron Sputtering. In: Book of abstracts of International Symposium on Reactive Sputter Depossition, Manchester, December 10–11, (2009), (eds. P. Kelly, J. Bradley).

[10] V. Stranak, M. Quaas, H. Steffen, R. Bogdanowicz, H. Wulff, Z. Hubicka, R. Hippler, Deposition and physical properties of homogeneous TiO2 and N-doped TiO2 films prepared by high power impulse magnetron sputtering. In: Book of abstracts of 1st International European Joint Committee on Plasma and Ion Surface Engineering (EJC-PISE) Workshop in Riga, Riga (Latvia), June 09-10, (2009).

[11] M. Quaas, V. Stranak, M. Cada, Z. Hubicka, K. Schroeder, K-D. Weltmann, R. Hippler, Physical properties of multi-structural thin Ti-Cu films deposited by High Power Impulse Magnetron Sputtering. In: Book of abstracts of International Symposium on Reactive Sputter Depossition, Manchester (UK), December 10– 11, (2009), (eds. P. Kelly, J. Bradley).

[12]  V. Stranak, M. Quaas, H. Steffen, R. Bogdanowicz, H. Wulff, Z. Hubicka, R. Hippler, Deposition and physical properties of thin TiO2 and N-doped TiO2 films prepared by High Power Impulse Magnetron Sputtering. In: Book of abstracts of DPG Spring Meeting – Section of Condensed Matter, Dresden, March 22-27, (2009), pp. 175 (DS 26.9), ISSN 0420-0195.

[13]  V. Stranak, M. Quaas, H. Wulff, Z. Hubicka, S. Wrehde, M. Tichy, R. Hippler, Study of pulsed magnetron deposition process during formation of thin TiOx films. In: Book of abstracts of 14th International Conference on Plasma Surface Engineering PSE 2008, Garmisch-Partenkirchen, September 15-19, (2008), pp. 454, (eds. board B. Schultrich, J. Strumpfel, W. Moller, U. Helmersson, R. dAgostino, C. Oehr, A. Cavaleiro).

[14] V. Stranak, M. Quaas, H. Wulff, Z. Hubicka, P. Adamek, S. Wrehde, R. Hippler, Deposition of thin films by pulsed magnetron sputtering. In: Book of abstracts of 19th Europhysics Conference on the Atomic and Molecular Physic of Ionized Gases ESCAMPIG 2008, Granada, July 15-19, (2008), (full-papers CD, eds. F. J. Gordillo-Vazquez, published by EPS - volume 32A), ISBN 2-914771-04-5.

[15] Z. Hubicka, M. Cada, P. Virostko, V. Stranak, S. Kment, J. Olejnicek, P. Adamek, P. Kudrna, M. Chichina, M. Tichy, Diagnostics of Pulse Low Temperature Plasma Systems during their Application for Deposition of Oxide Thin Films. In: Book of abstracts of 23rd Symposium on Plasma Physics and Technology 2008, Prague, June 16-19, (2008), p.126. ISBN 978-80-01-04030-0.

[16] V. Stranak, R. Bogdanowicz, S. Kment, Z. Hubicka, S. Wrehde, P. Kluson, M. Tichy, R. Hippler.  Optical, Photo-Electrochemical and Photocatalytic Properties of Nanostructured TiO2 Films Prepared by High Power Pulsed Magnetron. In: Book of abstracts of 23rd Symposium on Plasma Physics and Technology 2008, Prague, June 16-19, (2008), p.167. ISBN 978-80-01-04030-0.

[17] V. Stranak, S. Wrehde, Z. Hubicka, P. Adámek, J. Blazek, R. Hippler, M. Tichý, Deposition of TiOx thin films using pulsed dc planar magnetron system. In: Proceedings of Symposium on Vacuum based Science and Technology 2007, Greifswald, September 5-7, (2007), C1.

[18] M. Chichina, V. Stranak, P. Virostko, P. Kudrna, J. Olejníček, P. Adámek, O. Churpita, Š. Kment, Z. Hubička, M. Tichý, Using plasma sources of jet types for deposition of thin TiOx layers. In: Proceedings of  XVIII ISPC, Kyoto, August 26-31, (2007), (full-papers CD, eds. K. Tachibana et.al.), ISBN 978-4-9903773-3-5.

[19] V. Stranak, S. Kment, Z. Hubicka, P. Kluson, J. Krysa, H. Sichova, M. Tichy, P. Spatenka, Deposition of thin TiOx films by surfatron generated plasma. In: Proceedings of ICPIG XXVIII Confererence, 2007, Prague, July 15-20, (2007), (eds. J Schmidt, M. Simek, S. Pekarek, V. Prukner). ISBN 978-80-87026-00-7.

[20] V. Stranak, Z. Hubicka, P. Adamek, P. Virostko, J. Blazek, S. Wrehde, M. Tichy, R. Hippler, Investigation of pulsed magnetron discharge at different frequencies during deposition of TiOx thin films. In: Proceedings of  SAPP XVI, 2007, Podbanske, January 20-25, (2007), (ed. J. Matuska, S. Matejcik, J. D. Skalny), 263-264. ISBN 978-80-89186-13-6.

 [21] V. Stranak, M. Tichy, V. Kriha, V. Scholtz, Z. Navratil, P. Slavicek, P. Spatenka,  Bio-medical applications and diagnostics of microwave plasma. In: Proceedings of  ESCAMPIG 2006 Vol. 30G, Lecce, July 12-16, (2006), (ed. M. Cacciatore, S. D. Benedictis, P. F. Ambrico, M. Rutigliano), 441-442. ISBN 2-914771-38-X.

[22] V. Stranak, M. Tichy, V. Kriha, V. Scholtz, F. Houser, P. Spatenka, B. Sera, Biotechnological applications of surfatron plasma discharge. In: Proceedings of WDS 06, part II, Prague, June 6-9, (2006), (ed. J. Safrankova, J. Pavlu), 139-144, ISBN 80-86732-85-1.

[23] V. Stranak, M. Tichy, J. Blazek, Z. Navratil, P. Slavicek, P. Adamek, P. Spatenka, Surfatron plasma source working at frequency  2.45 GHz for technological applications. In: Proceedings of PLASMA-2005, AIP Vol. 812, Opole-Turawa, September 6-9, (2005), (eds. M. J. Sadowski, M. Dudeck, H.-J. Hartfuss, E. Pawelec), 181-190, ISBN 0-7354-0304-X.

[24] V. Stranak, M. Tichy, Z. Navratil, P. Slavicek, P. Adamek, J. Blazek, M. Prokysek, P. Spatenka, Surfatron plasma source of jet type - construction and diagnostics. In: Proceedings of  WDS 05, Prague, June 7-10, (2005), (ed. J. Safrankova), 319-325, ISBN 80-86732-59-2.

[25] V. Stranak, J. Blazek, S. Wrehde, H. Steffen, M. Tichy, P. Spatenka, R. Hippler, Langmuir probe disagnostics of Ar planar magnetron discharge with reactive admixture N2 and O2. In: Proceeding of 17th Conference ISPC, Toronto, August 7-12, (2005), (ed. J. Mostaghimi, T.W. Coyle, V.A. Pershin, H.R. Salimi Jazi).

[26] V. Stranak, J. Blazek, M. Tichy, P. Spatenka, H. Steffen, S. Wrehde, R. Hippler, Determination of negative ion density in slightly electronegative plasma. In: Proceedings of ICPIG XXVII Confererence, Eidhoven, July 17-22, (2005), (ed. E.M. van Veldhuizen), ISBN 90-386-2231-7.

[27] V. Stranak, Z. Navratil, P. Slavicek, M. Sery, M. Tichy, P. Spatenka, D. Trunec, Comparative diagnostics of Ar and He surfatron generated plasma by means of optical emission spectroscopy and probe measurements. In: Proceedings of 12th Conference ICPP, Nice, October 25-29, (2004).

[28] V. Stranak, Z. Navratil, P. Slavicek, M. Tichy, P. Spatenka, D. Trunec, Optical emission spectroscopy of Ar plasma generated by surfatron at frequency 2.45 GHz. In: Proceedings of the 17th Conference ESCAMPIG 2004, Constanta, September 1-5, (2004), (ed. V. Ciupina, G. Musa, R. Vladoiu), 181-183.

[29] V. Stranak, Z. Navratil, P. Slavicek, M. Sery, J. Blazek, P. Spatenka, M. Tichy, Optical emission spectroscopy and probe measurement in Ar/N2 surfatron discharge. In: Proceedings of  WDS 04, Part II, Prague, June 15-18, (2004), (ed. J. Safrankova),  339-343. ISBN 80-86732-32-0.

[30] V. Stranak, S. Wrehde, H. Steffen, R. Hippler, M. Tichy, Langmuir probe measurements in a dc-magnetron discharge. In: Proceedings of DPG Fruhjahrstagung 4/2004, Kiel, March 8-11, (2004), ISSN 0420-0195.

[30C] V. Stranak, M. Tichy, P. Adamek, J. Blazek, P. Spatenka, Probe measurement of the characteristics of surfatron generated argon plasma. In: Proceedings of WDS 03, Part II, Prague, June 10-13, (2003), (ed. J. Safrankova), 407-411, ISBN 80-86732-18-5.

[31] V. Stranak, M. Tichy, P. Adamek, J. Blazek, P. Kriz, P. Spatenka, Electron temperature in surfatron-generated plasma-jet in argon measured by double Langmuir probe. In: Proceedings of  ICPIG XXVI Confererence, Vol. 3., Greifswald, July 15-20, (2003), (ed. J. Meichsner, D. Loffhagen and H.-E. Wagner), 249-250, ISBN 3-00-011689-3.

[32] V. Stranak, M. Tichy, P. Adamek, J. Blazek, P. Kriz, A surfatron plasma source for material processing and biomedical application. In: Proceedings of  APP Spring Meeting, Bad Honnef, February 23-26, (2003), 129-132.